Mks Astron 2l Manual Jun 2026

MKS ASTRON® 2L is a compact, self-contained remote plasma source (RPS) used primarily for high-efficiency chamber cleaning in semiconductor manufacturing. It typically dissociates more than 95% of cap N cap F sub 3

Expose the sensor to ambient room pressure, navigate to the calibration menu, select the channel, and execute the "ATM" adjustment. mks astron 2l manual

: Achieve high dissociation efficiency (>94%) at standard operating pressures. Installation & Safety Requirements Electrical MKS ASTRON® 2L is a compact, self-contained remote

: The unit operates with internal high voltages; ensure the system is fully grounded via Pin 4 of the power connector before powering on. Installation & Safety Requirements Electrical : The unit

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The (specifically the AX7657 ) is a remote plasma source used primarily in semiconductor manufacturing for chamber cleaning and reactive gas generation. Because these are specialized industrial components, a formal "user manual" is often protected by MKS proprietary rights, but you can find technical specifications and operational overviews through industrial resellers and technical support platforms. Quick Technical Summary